|
Chemical
Resistance of E+E Humidity Sensors
|
Chemical |
Gas Concentration |
Harmless |
Negative Effect |
|
carbon monoxide CO |
up
to 400 ppm |
x |
|
|
ammonia-NH3 |
up
to 500 ppm |
x |
|
|
sulphur dioxide-SO2 |
up
to 100 ppm |
x |
|
|
formaldehyde-HCHO |
up
to 10 x MAC |
x |
|
|
Freon 113- C2Cl3F3 |
|
x |
|
|
chlorine-Cl2 |
up
to 10 x MAC |
x |
|
|
hydrogen chloride-HCL |
|
|
x |
|
hydrogen fluoride-HF |
|
|
x |
|
nitrogen dioxide-NO2 |
up
to 20 x MAC |
x |
|
|
ethanol-CH3CH2OH
(liquid: for cleaning; gas: harmless) |
|
x |
|
|
methanol-CH3OH
(liquid: for cleaning; gas: harmless) |
|
x |
|
|
ozone-
O3 |
up
to 10 x MAC |
x |
|
|
ultraviolet rays (at 300-400 nm & 2 J/cm² / time of exposure: approx. 5
minutes) |
Sensitive area of the sensor surface is protected by a metallic layer |
x |
|
|
Isopropanol-(CH3)2CHOH
(liquid: for cleaning; gas: harmless) |
|
x |
|
|
chlorine methane - CH3CL |
|
|
x |
|
ethylene oxide-C2H4O |
up
to 15% |
x |
|
|
hydrogen peroxide H2O2 |
up
to 10 x MAC |
x |
|
MAC
= Maximum Acceptable Concentration
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